IDENTIFICATION OF MECHANISMS FOR POTENTIAL SPUTTERING OF LiF SURFACES

G. Hayderer$^\ast$, C. Lemell$^\sharp$,$^\ast$, L. Wirtz$^\sharp$, M.
Schmid$^\ast$, 
J. Burgdörfer$^\sharp$, P. Varga$^\ast$, HP. Winter$^\ast$ and F. Aumayr$^\ast$

	$^\ast$Institut f. Allgemeine Physik, Technische Universität Wien,
A-1040 Wien, Austria
	$^\sharp$Institut f. Theoretische Physik, Technische Universität Wien,
A-1040 Wien, Austria

Potential sputtering (PS) of LiF by slow (typ. 100 eV) singly charged
ions has been studied using an improved quartz crystal microbalance
technique. In order to investigate the influence of the available
potential energy on PS various singly charged ions (from Na+ 5.1 eV to
He+ 24.6 eV) have been used. A potential energy threshold of about 10 eV
was determined. This threshold is consistent with the production of a
cold hole in the F-valence band of LiF by resonant electron capture.

    
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