INFLUENCE OF HOLE PRODUCTION ON SCATTERING OF SLOW HIGHLY CHARGED IONS AT INSULATOR SURFACES L. Wirtz$^a$, L. H\"agg$^b$, C. O. Reinhold$^c$, and J. Burg\"orfer$^{a}$ $^a$Institute of Theoretical Physics, Vienna University of Technology, A-1040 Wien, Austria $^b$Department of Physics and Mathematics, Mid Sweden University, S-851 70 Sundsvall, Sweden $^c$Oak Ridge National Laboratory, Oak Ridge, TN 37831-6373, USA We present a theoretical analysis of trajectories of slow highly charged ions infront of a LiF surface. When the ion approaches the surface, it is partially neutralized by multiple electron capture from the surface. Two forces influence the trajectory: The ion is attracted by the negative image charge in the surface and it is repelled by the positive holes that are created in the surface due to electron capture. We present results for the charge state, the energy distribution and the angular distribution of the backscattered ions and atoms.