INFLUENCE OF HOLE PRODUCTION 
ON SCATTERING OF SLOW HIGHLY CHARGED IONS AT INSULATOR SURFACES

L. Wirtz$^a$, L. H\"agg$^b$, C. O. Reinhold$^c$, and J. Burg\"orfer$^{a}$

$^a$Institute of Theoretical Physics, Vienna University of Technology, A-1040 Wien, Austria 
$^b$Department of Physics and Mathematics, Mid Sweden University, S-851 70 Sundsvall, Sweden 
$^c$Oak Ridge National Laboratory, Oak Ridge, TN 37831-6373, USA

We present a theoretical analysis of trajectories of slow highly charged ions infront of a LiF surface. When 
the ion approaches the surface, it is partially neutralized by multiple electron capture from the surface. Two 
forces influence the trajectory: The ion is attracted by the negative image charge in the surface and it is 
repelled by the positive holes that are created in the surface due to electron capture. We present results for 
the charge state, the energy distribution and the angular distribution of the backscattered ions and atoms.